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Product Details
- Manufacturer
- Thermo Fisher Scientific
- SKU
- 15414815
About this product
Nickel sputtering target, 50.8mm (2.0in) dia x 3.18mm (0.125in) thick, 99.99%
Nickel sputtering targets are high-purity metal discs used in thin-film deposition processes. They are commonly employed in semiconductor manufacturing, optical coatings, and various industrial applications requiring precise material deposition.
Specifications
- Material: Nickel (Ni)
- Purity: 99.99% (metals basis)
- Diameter: 50.8 mm (2.0 in)
- Thickness: 3.18 mm (0.125 in)
- Molecular Weight: 58.69 g/mol
- CAS Number: 7440-02-0
- Density: 8.9 g/cm³
- Melting Point: 1453°C
- Boiling Point: 3007°C
Uses
- Thin-film deposition in semiconductor manufacturing
- Optical coatings for mirrors and lenses
- Protective coatings in aerospace and automotive industries
- Magnetron sputtering for electronic components
- Research applications in material science
Features
- High purity for precise deposition
- Uniform thickness for consistent sputtering
- Excellent thermal and electrical conductivity
- Compatible with various sputtering systems
- Stable under high-temperature conditions
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