Nickel sputtering target, 50.8mm (2.0in) dia x 3.18mm (0.125in) thick, 99.99%

Nickel sputtering target, 50.8mm (2.0in) dia x 3.18mm (0.125in) thick, 99.99%

Nickel sputtering targets are high-purity metal discs used in thin-film deposition processes. They are commonly employed in semiconductor manufacturing, optical coatings, and various industrial applications requiring precise material deposition.

Specifications

• Material: Nickel (Ni)
• Purity: 99.99% (metals basis)
• Diameter: 50.8 mm (2.0 in)
• Thickness: 3.18 mm (0.125 in)
• Molecular Weight: 58.69 g/mol
• CAS Number: 7440-02-0
• Density: 8.9 g/cm³
• Melting Point: 1453°C
• Boiling Point: 3007°C

Uses

• Thin-film deposition in semiconductor manufacturing
• Optical coatings for mirrors and lenses
• Protective coatings in aerospace and automotive industries
• Magnetron sputtering for electronic components
• Research applications in material science

Features

• High purity for precise deposition
• Uniform thickness for consistent sputtering
• Excellent thermal and electrical conductivity
• Compatible with various sputtering systems
• Stable under high-temperature conditions