Cobalt Sputtering Target, 50.8 mm

Cobalt Sputtering Target, 50.8 mm

High-purity cobalt sputtering target designed for use in thin-film deposition processes, including magnetron sputtering, to produce cobalt coatings for various industrial and research applications.

Product Details:

• Chemical Formula: Co

• Molecular Weight: 58.93 g/mol

• CAS Number: 7440-48-4

• Purity: 99.95% (metals basis)

• Physical Form: Solid, odorless

• SMILES Representation: [Co]

Safety Information:

• Hazard Statements:

  • May cause an allergic skin reaction (H317).

  • May cause allergy or asthma symptoms or breathing difficulties if inhaled (H334).

  • May cause cancer (H350).

Uses

• Thin Film Deposition: Used in semiconductor manufacturing, magnetic storage devices, and optical coatings.

• Electroplating: Provides hardness, oxidation resistance, and an attractive appearance.

• Magnetic Applications: Essential for spintronics, MRAM, and high-frequency inductive components.

• Research & Development: Utilized in material science experiments and nanotechnology.

Features

• High Purity: Ensures consistent film quality and low contamination.

• Excellent Magnetic Properties: Ideal for magnetic thin films and sensor applications.

• Uniform Thickness: Provides stable deposition rates.

• Customizable: Available in different thicknesses and bonding options